Extending Design Technology Co-Optimization from Technology Launch to HVM with Calibre Fab Solutions

As semiconductor designs shrink, the challenges of manufacturing them flawlessly explode. Traditional Design-for-Manufacturing (DFM) and Design-Technology Co-Optimization (DTCO) struggle to tackle systematic defects arising from intricate design-process interactions.

This white paper dives deep into these issues and proposes a groundbreaking solution: Extended DTCO (EDTCO).

Access this white paper where DTCO bridges the gap, sending crucial pre-silicon data forward and feeding valuable post-silicon insights back. Plus, it enables you to:

• Leverage manufacturing data to refine layouts for improved yield and performance
• Proactively pinpoint and address defect sources, boosting yield and efficiency
• Utilize design insights to fine-tune manufacturing processes for better results